The Journal of
the Korean Journal of Metals and Materials

The Journal of
the Korean Journal of Metals and Materials

Monthly
  • pISSN : 1738-8228
  • eISSN : 2288-8241

Editorial Office

Title Chemical Vapor Deposition ( C . V . D )
Authors 천성순(John S Chun)
Page pp.116-122
ISSN 0454-627X
Abstract Chemical vapor deposition techniques have been applied to refractory metals, ceramics, semiconductors, insulators and conductors. The principles and techniques of chemical vapor deposition reactions for the above materials are reviewed. A new design concept of a high temperature hoop stress measurement apparatus for C.V.D. tungsten and other refractory metal alloys is discussed.