| Title |
Influence of Sputtering Condition on the Amorphous forming Range and Magnetic properties for Co - base Thin film alloys |
| Authors |
김희중(H . J . Kim); 한석희(S . H . Han); 강일구(I . K . Kang); 천성순(J . S . Chun) |
| Abstract |
The value of atomic size effect for Co-base thin film alloys made by RF sputtering was about 0.06, and this value increased with decrease of cooling rate. With increasing the negative heat of mixing between the constituent elements the value of atomic size effect was linearly decreased, and this trend was interpreted as kinetic effect. Saturation magnetization had a constant value except for the case of high Ar pressure. Coercive force decreased with increasing the input power and time, and rapidly increased with increase of Ar pressure. Change of coercive force was discussed as effects of film thickness, residual stress and columnar structure. To get an amorphous thin film alloys with good soft magnetic properties, it is concluded that 300 W of input power and 10 m torr of Ar pressure were optimal conditions for sputtering, and Cu and cover glass preferred to polyimide as substrate material. |