| Title |
Concentration Distribution of Condensable Chemical Spec in a Diffusion Mixing Gas - Phase Reator |
| Abstract |
It is described a computational model of the gas phase diffusion m reaction in the chemical vapor deposition reactor. The model, consider a diffusion mixing mode of source material for the reaction of SnCl₄ and water vapor, predicts condensable chemical species concentration distribution as a function of partial pressure of SnCl₄, reaction temperature and total vapor pressure in the reactor. It also predicts a particle size by collision theory. It is founded good agreement with experimental results. The model indicates concentraction distribution of condensable chemical species is important in predi partcle size. |