| Title |
Alternating Current electrochemical Etching of High Purity aluminum Foil ( Effect of chloride concentration , current density and frequency ) |
| Authors |
정재한(Jae Han Jeong) ; 김성수(Sung Su Kim) ; 김현기(Hyun Gi Kim) ; 최상희(Chang Hee Choi) ; 이동녕(Dong Nyung Lee) ; 오규환(Kyu Hwan Oh) |
| Abstract |
A study has been made of the effects of HCl concentration, current density and frequency on the etch pit size and distribution in 99.98% aluminum foil etched by alternating current electrochemical etching techinique and the capacitance of the foil after anodization. The highest capacitance was obtained under the etching condition of 1.5 M HCl and 10 ㎐ irrespective of current density. The higher chloride ion concentration and the current density and the lower frequency gave rise to the deeper etched layer and the smaller etch pit size. The individual etch pits were aggregated when the chloride ion concentration and current density decreased and the frequency increased. |