| Title |
A Study on the Separation of Hafnium from Zirconium with Versatic Acid - 10 |
| Authors |
김성규(Sung Gyu Kim); 이화영(Hwa Young Lee); 오종기(Jong Kee Oh) |
| Abstract |
Removal of hafnium from zirconium way carried out using solvent extraction with Versatic Acid-10 in order to produce the high purity zirconia. The results showed that zirconium was effectively extracted at the pH range of 2.1∼2.3, while hafnium was hardly extracted at this pH range. On the other hand, the stripping effect of zirconium was more effective in the case of using HCl as a stripping solution. When the zirconium oxychloride solution containing zirconium of 700ppm and hafnium of 18.9ppm was treated by Versatic Acid-l0 of 1M at a phase ratio of A/O=1/3 with six stages in the extraction and also by HCl of 1M at a phase ratio of O/A=1 with five stages in the stripping, the content of zirconium and hafnium in the stripping solution was 210ppm and <0.3ppm, respectively. High purity zirconia(99.84% ZrO₂) could be obtained by hydrolysis followed by the calcination of precipitates. |