| Title |
A Study on the Photocatalytic Properties of Sputtered TiO2 Films |
| Authors |
최진호(J . H . Choi) ; 신동훈(D . H . Shin) ; 장광필(K . P . Jang) ; 남궁규철(K . C . Namgung) ; 김장규(J . K . Kim) ; 이원재(W . J . Lee) |
| Abstract |
TiO₂ films deposited on glass were prepared by plasma sputtering method. The dependence of structural properties on the deposition conditions and the photocatalytic degradation of methylene blue were investigated. When the oxygen partial pressure was higher than 5%, as-deposited TiO₂ films exhibited an almost amorphous structure under DC plasma condition. A transition at which metallic mode deposition(Ti) changed to dielectric mode deposition(TiO₂), was observed at the 5∼10% oxygen partial pressure under RF plasma condition. The amorphous structure changed to anatase structure by heat treatment at 400℃ for 4 hours. Crystallized anatase structure had a preferred orientation along 〔101〕 direction. For 150 min of photocatalytic degradation, the concentration of methylene blue was reduced by half. |