The Journal of
the Korean Journal of Metals and Materials

The Journal of
the Korean Journal of Metals and Materials

Monthly
  • pISSN : 1738-8228
  • eISSN : 2288-8241

Editorial Office

Title Research Paper / Electronic Magnetic & Optical Materials : Effects of Ar pressure on the Quality of Film made by Evaporation
Authors 최상준(Sang Joon Choi); 홍재화(Jae Hwa Hong); 권순주(Soon Joo Kwon)
Page pp.328-333
ISSN 0253-3847
Abstract Generally, the density of films deposited by evaporation techniques are lower than sputtering, due to the lower kinetic energy of the evaporated atoms (or ions). The authors report an enhancement of the kinetic energy by increasing the chamber pressure with an inert gas (e.g., Ar). The validity of the idea has been proved with permalloy(NiN_(80)Fe_(20))/Cu multilayer films, of which the quality was characterized using synchrotron X-ray and atomic force microscopy.