| Title |
Research Paper / Electronic , Magnetic & Optical Materials : Effect of Preferred Orientation in Plasma Damage Properties of MgO Protective Layer for AC - PDPs |
| Authors |
손충용(Choong Yong Son); 조진희(Jin Hui Cho); 김낙환(Rak Hwan Kim); 김희재(Hee Jae Kim); 박종완(Jong Wan Park) |
| Abstract |
MgO thin films have been widely used as a surface protective layer in AC type plasma display panels (PDPs) due to its very low sputtering yield and large secondary electron emission capability. In this work, MgO thin films were prepared on soda lime glass substrates by rf magnetron sputtering method using a MgO target in order to analyze the effect of deposition parameters on their preferred orientation, microstructure and plasma damage properties. The preferred orientation of MgO films was changed from (200) to (111) as the distance from the target to the substrate decreased from 70 ㎜ to 20 ㎜. The MgO film deposited at a high gas pressure and at a long target-to-substrate distance has (200) preferred orientation and very high surface roughness as well as a tendency of columnar growth. However, by increasing the RF power and decreasing the target-to-substrate distance and the gas pressure, films were found to have (111) and (222) preferred orientation. Plasma erosion rate was minimized for the case of (111) preferred orientaion. |