| Title |
Micromechanical Analysis of the Effect of Residual Stress on the Nanoindentation Curve |
| Authors |
이윤희(Yun Hee Lee); 권동일(Dong Il Kwon) |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
Residual stress; Nanoindentation; Load-controlled relaxation; Tungsten single crystal |
| Abstract |
A new model is presented for measuring equi-biaxial stress on thin-film using nanoindentation. The model was focused on the analysis of a depth-shift in the nanoindentation curve by stress effect. A load-controlled relaxation of the shifted indentation depth was chosen to avoid the variation of the contact area occurred in a depth-controlled relaxation. Nanoindentation experiments on (100) W single crystal at artificial equi-biaxial stress states verified that the proposed load-controlled relaxation model is capable of analyzing the residual stress within the standard deviation of ±35.9 MPa. |