| Title |
Optical Devices,Display ; Preparation and Characterizations of ITO/Ag/ITO Thin Films Prepared by D.C. Magnetron Reactive Sputtering |
| Authors |
최용락(Yong Lak Choi); 김선화(Seon Hwa Kim) |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
ITO thin film; microstructure; multilayer; transmittance; sheet resistance |
| Abstract |
ITO/Ag/ITO multilayer thin films on PET and coming 1737 glass were prepared by D.C. magnetron reactive sputtering method. Ag layer was inserted for applying ITO to a flexible substrate at low temperature or room temperature. The crystallinity and the electrical-optical property of ITO/Ag/ITO thin films were investigated. ITO/Ag/ITG thin films were at room temperature and grew to be crystalline with (400) preferred plane as the substrate temperature increased. ITO/Ag/ITO thin films on PET showed the transmittance of above 80% when the thickness of Ag was 5 nm. The carrier concentration increased more than 10 times due to the effect layer, and the resistance was below 15 Ω/□ much lower than that of ITO thin film without As the deposition temperature increased, Ag oxide was formed at the boundary between ITO and is supposed to be a disturbing factor for the motion of electrical charge. |