| Title |
The Effect of Anodic Oxidation Condition of Titanium Substrate on the Nucleation and Crystal Growth of Electrodeposited Copper |
| Authors |
이현우(Hyun Woo Lee); 설경원(Kyeong Won Seol); 우태규(Tae Gyu Woo); 박일송(Il Song Park) |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
electrodeposition; copper foil; crystal growth; anodizing |
| Abstract |
Recently, requirement for the ultra thin copper foil increase with smaller and miniaturized electronic components. A study has been made to determine the effect of an electrochemically produced titanium-oxide film on the nucleation and growth of copper. The oxide films were made current step and potential step at 30℃ in 1.5M sulfuric acid on pure titanium metal. The formation of a microporous oxide layer on the titanium electrode greatly enhances the surface density of copper crystals. For a 50seconds of deposition, the surface roughness of the copper deposit is lower than that of the untreated surface. |