| Title |
Growth and Preferred Orientation of ITO Thin Film Deposited by D.C. Magnetron Sputtering |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
sputtering; ITO; thin film; preferred orientation; microstructure |
| Abstract |
ITO thin films were sputtered to evaluate the preferred orientation, the microstructure and crystallinity of the films on corning 1737 glass by systematically varying the process conditions including O2/(Ar+O2) ratio, film thickness and substrate temperature, respectively. As O2/(Ar+O2) ratio increased, ITO thin film was confirmed to be combined in addition to (400) and (440) plane. ITO thin film grew to the crystalline with preferred orientation of (400) plane as the substrate temperature and the film thickness increased. And the microstucture of ITO thin film also changed from amorphous phase to columnar structure which was composed of nano columns. Consequently, the preferred orientation of (400) plane of ITO thin film depended on the film thickness and the substrate temperature. |