| Title |
Effects of Current Density and Phosphoric Acid Concentration on Anodic Oxide Film of Titanium |
| Authors |
김계성(Kye Sung Kim); 정원섭(Won Sub Chung); 신헌철(Heon Cheol Shin); 최영선(Young Son Choe); 조영래(Young Rae Cho) |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
Ti oxide Layer; anodizing; current density; electrolyte; microstructure |
| Abstract |
The formation of anodic oxide film of titanium (Ti) was studied at a variety of electrolyte concentrations and current density to clarify their effects on morphology, microstructure and composition of Ti oxide layer. For the analysis of the Ti oxide films, a scanning electron microscopy (SEM), X-ray diffractometer (XRD), and X-ray photoelectron spectroscopy (XPS) were used. The results showed that the concentration of phosphoric acid played a crucial role in the crystalline structure of the Ti oxide layer while the current density gave a critical effect on the thickness and diameter of its pore. In particular, the crystalline anatase phase with a thickness larger than 2 ?m, which is quite desirable for a dental implant application, could be readily prepared at the phosphoric acid concentration of 0.5 M and current density higher than 2.0 A/dm2. |