| Title |
A Study on the Fabrication and Structural Properties of Al-Co/AlN-Co Thin Films |
| Authors |
(Chang-suk Han); (Seung-oh Han) |
| DOI |
https://doi.org/10.3365/KJMM.2011.49.3.256 |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
thin films; sputtering; magnetic properties; X-ray diffraction; resistivity |
| Abstract |
We have synthesized Al-Co/AlN-Co multilayer films with different layer thicknesses by using a Two-Facing Target Type dc Sputtering (TFTS) system. The deposited films were annealed isothermally at different temperatures and their microstructure, magnetic properties and resistivity were investigated. The magnetization of the as-deposited films was found to be very small, irrespective of layer thickness. It was found that the annealing conditions and layer thickness ratio of Al-Co to AlN-Co (LTR) were able to control the microstructure, as well as the physical properties of the prepared films. The resistivity and magnetization increased and the coercivity decreased with a decreasing LTR. A high resistivity of 2500 μΩ-cm, a magnetization of 360 emu/cm3, and a coercivity of 5Oe were obtained for the films with LTR=0.175. |