| Title |
Fabrication and Evaluation Properties of Titanium Sintered-body for a Sputtering Target by Spark Plasma Sintering Process |
| Authors |
이승민(Seung Min Lee); 박현국(Hyun Kuk Park); 윤희준(Hee Jun Youn); 양준모(Jun Mo Yang); 우기도(Kee Do Woo); 오익현(Ik Hyun Oh) |
| DOI |
https://doi.org/10.3365/KJMM.2011.49.11.845 |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
spark plasma sintering process; Ti; temperature gradient; rapid sintering; sputtering target |
| Abstract |
The Spark Plasma Sintering(SPS) method offers a means of fabricating a sintered-body having high density without grain growth through short sintering time and a one-step process. A titanium compact having high density and purity was fabricated by the SPS process. It can be used to fabricate a Ti sputtering target with controlled parameters such as sintering temperature, heating rate, and pressure to establish the optimized processingconditions. The compact/target(?) has a diameter of Φ150×6.35 mm. The density, purity, phase transformation, and microstructure of the Ti compact were analyzed by Archimedes, ICP, XRD and FESEM. A Ti thin-film fabricated on a Si/SiO2 substrate by a sputtering device (SRN-100) was analyzed by XRD, TEM, and SIMS. Density and grain size were up to 99% and below 40 ?m, respectively. The specific resistivity of the optimized Ti target was 8.63×10-6 Ω·cm. |