| Title |
Formation of MoSi2 Layer by Hydrogen Reduction and Si-pack Cementation |
| Authors |
전인목(In Mok Jeon); 변종민(Jong Min Byun); 김세훈(Se Hoon Kim); 김진우(Jin Woo Kim); 김영도(Young Do Kim) |
| DOI |
https://doi.org/10.3365/KJMM.2012.50.9.653 |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
thin films; coating; diffusion; scanning electron microscopy; SEM; hydrogen reduction |
| Abstract |
In this study, a molybdenum disilicide (MoSi2) coating process was investigated by hydrogen reduction and Si-pack cementation. At first, the metallic Mo coating was carried out by hydrogen reduction of MoO3 powder at 750℃ for various holding times (1, 2, 3 h) in hydrogen atmosphere. A 4.3 ㎛thick metallic molybdenum thin film was formed at 3 h. MoSi2 was obtained by Si-pack cementation on molybdenum thin film through hydrogen reduction processing. It was carried out using Si : Al2O3 : NH4Cl = 5 : 92 : 3 (wt%) packs at 900℃ for various holding times (30, 60, 90 min) in Ar atmosphere. When the holding time was 90 min, a MoSi2 layer was coated successfully and a 15.4 ㎛thickness was observed. |