| Title |
Effect of the substrate bias voltage on the mechanical properties of nanocomposite CrZrSiN thin films |
| Authors |
김규성(Kyu Sung Kim); 김회근(Hoe Kun Kim); 라정현(Joung Hyun La); 김광배(Kwang Bae Kim); 이상율(Sang Yul Lee) |
| DOI |
https://doi.org/10.3365/KJMM.2015.53.8.549 |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
thin films; plasma deposition; mechanical properties; transmission electron microscopy; TEM |
| Abstract |
Nanocomposite CrZrSiN thin films were deposited with various substrate bias voltages from 0 to -200 V using unbalanced magnetron sputtering. The crystalline structure, microhardness, microstructure, and adhesion properties of the CrZrSiN thin films were evaluated by X-ray diffraction, Fischer scope, field-emission scanning electron microscopy, and a scratch tester. The surface roughness and deposition rate decreased with an increase in the substrate bias voltage. The substrate bias voltage increased and the hardness increased to 36 GPa at -100 V, then decreased to 32 GPa as the substrate bias voltage further increased to -200V. The CrZrSiN thin films maintained their hardness up to 800℃ while the hardness of CrZrN film decreased rapidly over 500℃. The critical load (Lc3) increased from 8 N to 35 N up to a substrate bias voltage of -100 V, while the critical load decreased to 8 N with further increase of the substrate bias voltage. (Received February 07, 2015) |