| Title |
Effects of TiO2 buffer layer on the photoelectrochemical properties of TiO2 Nanorods grown by modified chemical bath deposition method |
| Authors |
이태현(Tae Hyun Lee); 하진욱(Jin Wook Ha); 류혁현(Hyukhyun Ryu); 이원재(Won Jae Lee) |
| DOI |
https://doi.org/10.3365/KJMM.2015.53.8.591 |
| ISSN |
1738-8228(ISSN), 2288-8241(eISSN) |
| Keywords |
photoelectrochemical; buffer layer; spin coating; nanorods; photocurrent density; semiconductors; chemical synsthesis; coating; crystal structure; scanning electron microscopy; SEM |
| Abstract |
In this study, we grew TiO2 nanorods on TiO2-film buffered FTO substrate using modified chemical bathdeposition (M-CBD). The TiO2 buffer layer was grown by spin coating method with different RPM (revolutions per minute) values and deposition cycles. We investigated the effects of the RPM values and the deposition cycles on the morphological, structural and photoelectrochemical properties of TiO2 nanorods. In this work, we have also found that the morphological and structural properties of TiO2 nanorods affected the photoelectrochemical properties of TiO2 nanorods. And the maximum photocurrent density of 0.34 mA/cm2 at 0.6V (vs.SCE) was obtained from the buffer layer deposition process condition of 4,000 RPM and two-times buffer layer depositions. (Received July 29, 2014) |