(Moo Young Jung)
1
(Chang Su Nam)
1
(Byung-Sik Lee)
2
(Yong Choi)
1*
Copyright © 2020 The Korean Institute of Metals and Materials
Key words(Korean)
electrodeposition, Ni-P, thiourea
1. INTRODUCTION
Electroplated nickel-phosphorus (Ni-P) deposits are utilized in various industries
such as automobile components, machinery, aerospace and electronics, because of their
good physical, chemical and mechanical properties [1-7].
Usually, the electroless and electrodeposited Ni-P films are classified into three
groups according to P content: high (9 wt% above), medium (5~8 wt%) or low (1~5 wt%)
P deposits. Previous studies have revealed that the high P deposits have a fully amorphous-nanocrystalline
structure [5,6,8], whereas the low and medium P deposits can be either crystalline or microcrystalline,
with either amorphousnanocrystalline or mixtures of crystalline and amorphous-like
structures [9,10].
In terms of properties like hardness and corrosion resistance, the microhardness of
the electroless Ni-P deposit was increased by decreasing P content [5,6]. The Ni-P deposition has a higher dissolution rate than a conventional Ni deposit.
The Ni-P deposit tends to be more uniformly corroded than the conventional Ni deposits
because of its nanocrystalline structure which suffers excessive intergranular corrosion
in acid atmosphere [11,12].
These kinds of mechanical and chemical properties of the Ni-P deposits can be controlled
by the plating condition such as the temperature of the bath, pH and the type of additives.
Lead acetate is known as a stabilizer in the electroless or electrodeposited Ni-P
process. Since the toxic characteristics of the lead have limited the use of this
stabilizer, some investigators have chosen other additives such as thiourea [13,14].
It is known that the thiourea enhances the deposition rate by lowering the activation
energy of the deposition of the Ni ion [15]. In case of too much thiourea is adsorbed on the substrate, it can inhibit the deposition
reaction by poisoning the catalytic activity of the accidentally formed NiP or metal
hydroxide nuclei because of the effect of the thiourea on the surface coverage of
the substrate [16].
Since the electroless Ni-P process is performed at about 90 ℃ and needs more time
and energy, the electroplate process is preferred for Ni-P deposit in the field [21]. Although the effect of thiourea on electroless Ni-P deposits have been carried
out, little information is available for the effect of thiourea on electroplated Ni-P
deposits, especially about mechanical and chemical properties of the Ni-P deposit.
Hence, the objective of this study is to investigate the effect of the thiourea on
the mechanical and corrosion behavior of the electroplated Ni-P deposits in metallurgical
point of view.
2. EXPERIMENTAL METHODS
2.1 Sample preparation
Ni-P deposits were prepared by conventional electrodeposition method with a modified
sulfate bath. Table 1 is the bath of the Ni-P electrodeposition. The Ni-P bath solution is composed of
a nickel sulfamate solution, phosphorous acid and boric acid, respectively. Various
amounts of thiourea were added to the bath solution over the range of 0.01~0.1 g/L
to observe the variation of the properties of the electroplated Ni-P deposits.
The titanium electrode and 304 stainless steel plate as a substrate were used. The
substrate was electrolytic polished in 0.2N sulfuric acid (H2SO4) to remove debris and prepare a fine surface roughness prior to the electroforming
of the NiP deposit. The Ni-P electrodeposition was conducted at 50 ℃ and 0.02 A/cm2 in the modified sulfate bath for an hour to have a similar thickness.
2.2 Microstructure, phase analysis and mechanical tests
Surface morphologies and cross sections were observed by atomic force microscopy (Pafm
nx II, Em4sys, Korea) and scanning electron microscopy (CX-200TA, Coxem, Korea), respectively.
The phase analysis was carried out by X-ray diffractometry (Ultima IV, Rigaku, Japan)
at a diffraction angle from 30 o to 100 o, step rate of 0.02 o/sec and Cu·Kα line
at room temperature. Chemical analysis was performed by energy dispersive spectroscopy
(Noran, Thermo, USA). The mechanical properties of the Ni-P deposits prepared with
and without thiourea was determined by dynamic nanoindentation method (Ti750, Hysitron,
USA) for the specimens with similar thickness.
3. RESULTS AND DISCUSSION
3.1 Chemical analysis
Figure 1 and Table 2 are the composition variation of the Ni-P deposits with thiourea in the bath. As
shown in Fig 1 and Table 2, the amount of Ni and P in the Ni-P deposits were 87.98, 96.74, 97.47, 98.91, 98.90
and 98.41 wt% and 12.12, 3.36, 2.53, 1.19, 1.10 and 1.59 wt%, respectively, as the
thiourea content changed from 0.01 to 0.1 g/L. The P content in the Ni-P deposits
decreased increasing the thiourea content in the bath solution whereas the Ni content
increased the present data accords with the results reported by Lin et al. [14].
3.2 Phase identification
Figure 2 is the XRD spectra of the Ni-P deposits with thiourea. Figure 2-(a) is the spectra of the electrodeposited Ni-P layer without any additives. Figure 2-(b), (c), (d), (e) and (f) are the spectra of the electrodeposited Ni-P layers with thiourea in amounts of 0.01,
0.03, 0.05, 0.07 and 0.1 g/L, in order. As shown in Fig 2, the XRD spectra of the Ni-P deposit without thiourea has a broad peak in the range
of 35~55o, which indicates an amorphous-nanostructure [6,9]. However, the XRD peaks for the deposits with thiourea show the crystalline structure
with preferred orientations like splitting into planes of (111), (200), which indicates
the crystalline Ni structure with face centered cubic structure (FCC) [10,20]. Considering these XRD peaks, the Ni-P deposits with thiourea are mainly composed
of a Ni based structure. For the 0.01 g/L thiourea the intensity of (200) peak was
higher than that of the (111) peak. As the amount of thiourea increased in the bath,
the (111) peak of the Ni-P deposits increased and (200) peak decreased which dissipates
entirely. It supports that the thiourea intensifies the (111) peak and crystallinity
of the deposits. Since the amorphousnanostructure is formed for the Ni-P deposit with
more than 7 wt% of P [15,17], the crystallinity of the Ni-P with thiourea is due to the low content of P of the
Ni-P deposits [14].
3.3 Surface morphologies microstructure and mechanical properties
Figure 3 is the surface images of the electrodeposited NiP deposits with thiourea. As shown
in Fig 3, the surface morphology of the Ni-P deposits without the additive and with 0.01 g/L
thiourea has almost no nodules and relatively smooth and clean surfaces [18]. However, the surface morphologies of the Ni-P deposits with 0.03, 0.05, 0.07 and
0.1 g/L thiourea had more cauliflower-like nodules and subnodules on the surface of
the deposits [19]. The surface roughness (RRMS) of the Ni-P deposits determined by atomic force microscopy increased from 6 to 54
nm with thiourea.
Figure 4 is the cross-sectional view of the Ni-P deposits with thiourea. As shown in Fig 4, the thickness of the Ni-P deposits with thiourea were 29.6, 18.2, 14.3, 13.5, 12.1
and 10.9 μm, respectively, which increasing the content of indicates that the thickness
of the Ni-P deposits decreases with increasing the content of thiourea in the bath
solution for the same plating time of one hour. Accordingly, the variation in the
surface morphology and the reduction in thickness of the Ni-P deposits with thiourea
can be attributed to the effect of thiourea on the grain growth of the nodules. The
thiourea adsorbed on the surface of the substrate tends to retard the reduction of
the Ni and P ions for the nucleation step. Figure 5 is the surface morphologies of the Ni-P deposits. As shown in Fig 4 and Fig 5, the size of the columnar grains tends to increase with increasing the content of
thiourea.
Table 3 shows the surface roughness and mechanical properties of the Ni-P deposits with thiourea.
As shown in Table 3, the surface roughness of the deposits increased from 6 to 54 nm with the addition
of 0.1 ppm of thiourea. It implies that the average grain size of the columnar deposits
increased with thiourea. The elastic modulus, hardness and stiffness of the Ni-P deposits
increased by addition of 0.1 ppm of thiourea, from 77 to 156 GPa, 6.6 to 8.9 GPa and
109.6 to 186.6 μN/nm, respectively. Since the (111) plane of the deposits preferentially
grew in Fig 2, the preferential growth in crystallinity is one of attributions on the nano-hardening
of the Ni-P deposits with thiourea. Besides, the increase in stiffness and elastic
modulus related to the decrease in P contents. According to the non-equilibrium Ni-P
binary phase diagram, the Ni-P deposits with a low, medium and high P content consist
of β(crystalline), β+γ(crystalline + amorphous) and γ(amorphous) phases. Since the
β phase has greater hardness than the γ phase, the nano-hardness of the Ni-P deposits
increased as the P content decreased [6].
4. CONCLUSIONS
1. The P content of the Ni-P deposits decreased with increasing thiourea content in
the bath, whereas, the Ni content of the deposits increased with thiourea.
2. The thiourea intensified the (111) peak and crystallinity of the electrodeposited
Ni-P deposits.
3. The surface morphologies of deposits without additive and with 0.01 g/L of thiourea
had almost no nodules and were relatively smooth and clean. Those of the Ni-P deposits
with 0.03, 0.05, 0.07 and 0.1 g/L thiourea had more cauliflower-like nodules and sub-nodules
on the surface. The surface roughness of the Ni-P deposits determined by atomic force
microscopy increased from 6 to 54 nm with the addition of 0.1 ppm of thiourea.
4. The elastic modulus, hardness and stiffness of the Ni-P deposits with thiourea
increased from 77 to 156 GPa, 6.6 to 8.9 GPa and 109.6 to 186.6 μN/nm, respectively.
The hardening of the Ni-P deposits with thiourea is related to the preferential growth
of crystallinity and P content. Increased stiffness and elastic modulus resulted from
a decrease in P content which led to the β phase instead of γ phase.
Acknowledgements
C. S. Nam and B. S. Lee thank the National Research Foundation of Korea (NRF), granted
financial resource from the Ministry of Science, ICT and Future Planning (No. 2016M2B2B1945084),
Republic of Korea.
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Figures and Tables
Fig. 1.
Ni and P concentration profiles of the electrodeposited Ni-P layers with thiourea:
(a) Ni (b) P
Fig. 2.
XRD spectra of the electrodeposited Ni-P layers with thiourea [g/L]: (a) no additives
(b) 0.01 (c) 0.03 (d) 0.05 (e) 0.07 (f) 0.1
Fig. 3.
Surface images of the electrodeposited Ni-P layers with thiourea [g/L]: (a) 0 (b)
0.01 (c) 0.03 (d) 0.05 (e) 0.07 (f) 0.1
Fig. 4.
Cross-sectional view of electrodeposited Ni-P layers with thiourea [g/L]: (a) 0 (b)
0.01 (c) 0.03 (d) 0.05 (e) 0.07 (f) 0.1
Fig. 5.
Surface morphologies of electrodeposited Ni-P layers with thiourea [g/L]: (a) no additive
(b) 0.01 (c) 0.03 (d) 0.05 (e) 0.07 (f) 0.1
Table 1.
Bath composition of the Ni-P electrodeposition
|
Parameter
|
Amount
|
|
Nickel Sulfamate Solution [mL]
|
300
|
|
Phosphorous acid [g/L]
|
27
|
|
Boric acid [g/L]
|
25
|
|
Thiourea [g/L]
|
Controlled
|
Table 2.
Compositions of the Ni-P deposits with thiourea
|
TU [g/L]
|
0
|
0.01
|
0.03
|
0.05
|
0.07
|
0.1
|
|
Ni [wt%]
|
87.98
|
96.74
|
97.47
|
98.91
|
98.90
|
98.41
|
|
P [wt%]
|
12.12
|
3.36
|
2.53
|
1.19
|
1.10
|
1.59
|
Table 3.
Mechanical properties and surface roughness of the Ni-P deposits with thiourea
|
Thiourea [ppm]
|
Er [GPa]
|
Hardness [GPa]
|
Stiffness [µN/nm]
|
RRMS [nm]
|
|
0
|
77±3
|
6.3±3
|
109.6±3
|
6±3
|
|
0.01
|
114±3
|
7.7±3
|
148.0±3
|
11±3
|
|
0.03
|
116±3
|
8.6±3
|
142.1±3
|
24±3
|
|
0.05
|
125±3
|
8.7±3
|
162.2±3
|
46±3
|
|
0.07
|
147±3
|
8.9±3
|
183.3±3
|
50±3
|
|
0.10
|
156±3
|
8.9±3
|
186.6±3
|
54±3
|