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KJMM
Korean Journal of Metals and Materials
About KJMM
Aims and Scope
About the Journal
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Open Access
Latest articles
All issues
For Authors &
Reviewers
Instruction for Authors
Ethics
Contact us
The Journal of
the Korean Journal of Metals and Materials
The Journal of
the Korean Journal of Metals and Materials
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pISSN : 1738-8228
eISSN : 2288-8241
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2021-12
(Vol.59, No.12)
10.3365/KJMM.2021.59.12.849
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REFERENCES
1
Böscke T., Müller J., Bräuhaus D., Schröder U., Böttger U., Appl. Phys. Lett,99, 102903 (2011)
2
Park M. H., Lee Y. H., Kim H. J., Kim Y. J., Moon T., Kim K. D., Mueller J., Kersch A., Schroeder U., Mikolajick T., Adv. Mater,27, 1811 (2015)
3
Park M. H., Lee Y. H., Mikolajick T., Schroeder U., Hwang C. S., MRS Commun,8, 795 (2018)
4
Schenk T., Hoffmann M., Pešić M., Park M., Richter C., Schroeder U., Mikolajick T., Phys. Rev. Appl,10, 064004 (2018)
5
Park J. Y., Yang K., Lee D. H., Kim S. H., Lee Y., Reddy P. S., Jones J. L., Park M. H., J. Appl. Phys,128, 240904 (2020)
6
Mikolajick T., Slesazeck S., Park M. H., Schroeder U., MRS Bull,43, 340 (2018)
7
J. Müller, E. Yurchuk, T. Schlösser, J. Paul, R. Hoffmann, S. Müller, D. Martin, S. Slesazeck, P. Polakowski and J. Sundqvist, 2012 Symposium on VLSI Technology (VLSIT), 2012, pp. 25-26,
8
J. Müller, T. Böscke, S. Müller, E. Yurchuk, P. Polakowski, J. Paul, D. Martin, T. Schenk, K. Khullar and A. Kersch, 2013 IEEE International Electron Devices Meeting, 2013, pp. 10.8.1-10.8.4,
9
S. Dünkel, M. Trentzsch, R. Richter, P. Moll, C. Fuchs, O. Gehring, M. Majer, S. Wittek, B. Müller and T. Melde, 2017 IEEE International Electron Devices Meeting (IEDM), 2017, pp. 19.7.1-19.7.4,
10
Sang X., Grimley E. D., Schenk T., Schroeder U., LeBeau J. M., Appl. Phys. Lett,106, 162905 (2015)
11
Ohtaka O., Fukui H., Funakoshi K., Utsumi W., Irifune T., Kikegawa T., High Press. Res,22, 221 (2002)
12
Rios S., Ruediger A., Jiang A., Scott J., Lu H., Chen Z., J. Phys.: Condens. Matter,15, L305 (2003)
13
Sepliarsky M., Phillpot S., Wolf D., Stachiotti M., Migoni R., Phys. Rev. B,64, 060101 (2001)
14
Ravichandran J., Yadav A. K., Cheaito R., Rossen P. B., Soukiassian A., Suresha S., Duda J. C., Foley B. M., Lee C.-H., Zhu Y., Nat. Mater,13, 168 (2014)
15
Bousquet E., Dawber M., Stucki N., Lichtensteiger C., Hermet P., Gariglio S., Triscone J.-M., Ghosez P., Nature,452, 732 (2008)
16
Kanno I., Hayashi S., Takayama R., Hirao T., Appl. Phys. Lett,68, 328 (1996)
17
Lee H. N., Christen H. M., Chisholm M. F., Rouleau C. M., Lowndes D. H., Nature,433, 395 (2005)
18
Dawber M., Lichtensteiger C., Cantoni M., Veithen M., Ghosez P., Johnston K., Rabe K., Triscone J.-M., Phys. Rev. Lett,95, 177601 (2005)
19
Tsurumi T., Harigai T., Tanaka D., Nam S.-M., Kakemoto H., Wada S., Saito K., Appl. Phys. Lett,85, 5016 (2004)
20
M. H. Park, Kim, Y. J., Kim, H. J., Moon, T., Kin, K. Do, Lee, Y. H., Hwang, and C. S., ISAF-ISIF-PFM-2015 The Ferroelectric Properties of HfO2/ZrO2 Nanolaminate Systems, Singapore, May 24−27, 2015 (2015),
21
Park M. H., Kim H. J., Lee G., Park J., Lee Y. H., Kim Y. J., Moon T., Kim K. D., Hyun S. D., Park H. W., Appl. Phys. Rev,6, 041403 (2019)
22
Lu Y., Shieh J., Tsai F., Acta Mater,115, 68 (2016)
23
Weeks S. L., Pal A., Narasimhan V. K., Littau K. A., Chiang T., ACS Appl. Mater. Interfaces,9, 13440 (2017)
24
Lee D. H., Lee Y., Yang K., Park J. Y., Kim S. H., Reddy P. R. S., Materano M., Mulaosmanovic H., Mikolajick T., Jones J. L., Appl. Phys. Rev,8, 021312 (2021)
25
Park M. H., Lee Y. H., Hwang C. S., Nanoscale,11, 19477 (2019)
26
Park M. H., Lee Y. H., Mikolajick T., Schroeder U., Hwang C. S., Adv. Electron. Mater,5, 1800522 (2019)
27
Park M. H., Lee Y. H., Kim H. J., Kim Y. J., Moon T., Kim K. Do, Hyun S. D., Mikolajick T., Schroeder U., Hwang C. S., Nanoscale,10, 716 (2018)
28
Park M. H., Lee Y. H., Kim H. J., Schenk T., Lee W., Kim K. Do, Fengler F. P., Mikolajick T., Schroeder U., Hwang C. S., Nanoscale,9, 9973 (2017)
29
Park M. H., Kim H. Joon, Kim Y. Jin, Moon T., Hwang C. Seong, Appl. Phys. Lett,104, 072901 (2014)
30
Park M. H., Kim H. J., Kim Y. J., Moon T., Kim K. Do, Hwang C. S., Nano Energy,12, 131 (2015)
31
Park M. H., Kim H. J., Kim Y. J., Moon T., Kim K. D., Hwang C. S., Adv. Energy Mater,4, 1400610 (2014)
32
Hoffmann M., Schroeder U., Künneth C., Kersch A., Starschich S., Böttger U., Mikolajick T., Nano Energy,18, 154 (2015)
33
Migita S., Ota H., Asanuma S., Morita Y., Toriumi A., Appl. Phys. Express,14, 051006 (2021)
34
McBriarty M. E., Narasimhan V. K., Weeks S. L., Pal A., Fang H., Petach T. A., Mehta A., Davis R. C., Barabash S. V., Littau K. A., physica status solidi (b),257, 1900285 (2020)
35
Chen Y., Wang L., Liu L., Tang L., Yuan X., Chen H., Zhou K., Zhang D., J. Mater. Sci,56, 6064 (2021)
36
K. Ni, J. Smith, H. Ye, B. Grisafe, G. B. Rayner, A. Kummel and S. Datta, 2019 IEEE International Electron Devices Meeting (IEDM), 2019, pp. 28.8.1-28.8.4,
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