The Journal of
the Korean Journal of Metals and Materials

The Journal of
the Korean Journal of Metals and Materials

Monthly
  • pISSN : 1738-8228
  • eISSN : 2288-8241

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All issues http://journal.cricit.kr/kjmm

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2011-04

201104 (Vol.49, No.4)

P.275

Reliability Prediction of Long-term Creep Strength of Gr. 91 Steel for Next Generation Reactor Structure Materials

김우곤(Woo Gon Kim); 박재영(Jae Young Park); 윤송남(Song Nan Yin); 김대환(Dae Whan Kim); 박지연(Ji Yeon Park); 김선진(Seon Jin Kim)
https://doi.org/10.3365/KJMM.2011.49.4.275
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P.281

Selective Surface Oxidation of 590MPa TRIP Steel and Its Effect on Hot-Dip Galvanizability

김성환(Seong Hwan Kim); 임준모(Jun Mo Im); 허주열(Joo Youl Huh); 이석규(Suk Kyu Lee); 박노범(Rho Bum Park); 김종상(Jong Sang Kim)
https://doi.org/10.3365/KJMM.2011.49.4.281
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P.291

Deformation Behavior of 6063 Al Alloy Deformed by Shear-Drawing Method

고영건(Young Gun Ko); 이병욱(Byung Uk Lee); 신동혁(Dong Hyuk Shin)
https://doi.org/10.3365/KJMM.2011.49.4.291
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P.298

Hydrogen Storage Characteristics of Melt Spun Mg-23.5Ni-xCu Alloys and Mg-23.5Ni-2.5Cu Alloy Mixed with Nb2O5 and NbF5

(Seong Hyeon Hong); (Sung Nam Kwon); (Myoung Youp Song)
https://doi.org/10.3365/KJMM.2011.49.4.298
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P.304

Design and Fabrication of MOSFET Type Hydrogen Gas Sensor Using MEMS Process

김범준(Bum Joon Kim); 김정식(Jung Sik Kim)
https://doi.org/10.3365/KJMM.2011.49.4.304
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P.313

Property of Nano-thick Silicon Films Fabricated by Low Temperature Inductively Coupled Plasma Chemical Vapor Deposition Process

신운(Yun Shen); 심갑섭(Gap Seop Sim); 최용윤(Yong Yoon Choi); 송오성(Oh Sung Song)
https://doi.org/10.3365/KJMM.2011.49.4.313
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P.321

Nano-thick Nickel Silicide and Polycrystalline Silicon on Polyimide Substrate with Extremely Low Temperature Catalytic CVD

송오성(Oh Sung Song); 최용윤(Yong Yoon Choi); 한정조(Jung Jo Han); 김건일(Gun Il Kim)
https://doi.org/10.3365/KJMM.2011.49.4.321
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P.329

Conduction Noise Absorption by Sn-O Thin Films on Microstrip Lines

김성수(Sung Soo Kim)
https://doi.org/10.3365/KJMM.2011.49.4.329
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P.334

Study on the Mechanism and Modeling for Super-filling of High-Aspect-Ratio Features with Copper by Catalyst Enhanced Chemical Vapor Deposition Coupled with Plasma Treatment

김창규(Chang Gyu Kim); 이도선(Do Seon Lee); 이원종(Won Jong Lee)
https://doi.org/10.3365/KJMM.2011.49.4.334
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P.342

Electron Field Emission Characteristics of Silicon Nanodots Formed by the LPCVD Technique

안승만(Seung Man An); 임태경(Tae Kyung Yim); 이경수(Kyung Su Lee); 김정호(Jeong Ho Kim); 김은겸(Eun Kyeom Kim); 박경완(Kyoung Wan Park)
https://doi.org/10.3365/KJMM.2011.49.4.342
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